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A Comparative Study on p-ZnO:AlAs-ZnO:Al and p-ZnO:AlAsN-ZnO:Al Bilayer Homojunction Diodes Performance

机译:p-ZnO:AlAs / n-ZnO:Al与p-ZnO:AlAsN / n-ZnO:Al双层同质结二极管性能的比较研究

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摘要

An attempt has been made to study the performance comparison of homojunctions fabricated using AlAs codoped and AlAsN tridoped low resistive and stable p-ZnO thin films for optoelectronics devices (light emitting diodes and optic sensors) application. The Al monodoped ZnO film has been used as n-layer. X-ray diffraction and time of flight-secondary ion mass spectrometry confirms the formation of good structural quality bilayer homojunction. The junction parameters have been determined using I-V characteristics of the junction by Cheung's and Norde's methods. It has been found that, the homojunction fabricated using tridoped ZnO film showed better performance in comparison with codoped film.
机译:已经尝试研究使用AlAs共掺杂和AlAsN三掺杂低电阻且稳定的p-ZnO薄膜制造的同质结的性能比较,这些薄膜用于光电器件(发光二极管和光学传感器)。 Al单掺杂ZnO膜已经用作n层。 X射线衍射和飞行时间二次离子质谱法证实了良好的结构质量双层同质结的形成。结的参数已通过Cheung和Norde的方法使用结的I-V特性确定。已经发现,与共掺杂膜相比,使用三掺杂ZnO膜制造的同质结表现出更好的性能。

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