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首页> 外文期刊>Ionics >Fast electrochromic response of porous-structured cobalt oxide (Co3O4) thin films by novel nebulizer spray pyrolysis technique
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Fast electrochromic response of porous-structured cobalt oxide (Co3O4) thin films by novel nebulizer spray pyrolysis technique

机译:新型雾化器喷雾热解技术对多孔结构氧化钴(Co3O4)薄膜的快速电致变色响应

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摘要

Electrochromic effect of cobalt oxide thin films was studied as a function of substrate temperature (573-673 K). Tricobalt tetraoxide (Co3O4) thin films were deposited on glass and fluorine-doped tin oxide (FTO) substrates by nebulized spray technique using cobalt nitrate as precursor material. The XRD patterns indicated (311) plane was dominant for all the films irrespective of the deposition temperature. Williamson-Hall (W-H) analysis was made to understand the strain variation in the prepared Co3O4 films under different deposition temperature by employing uniform deformation model (UDM). Scanning electron microscopy images revealed porous morphology for the film prepared at 623 K. The optical parameters such as refractive index (n), extinction coefficient (k), and band gap were derived from UV-visible spectra of Co3O4 films. The electrochromic performance of the deposited Co3O4 films was analyzed through cyclic voltammetry, chronocoulometry, chronoamperometry, and iono-optical studies.
机译:研究了氧化钴薄膜的电致变色效应与衬底温度(573-673 K)的关系。使用硝酸钴作为前体材料,通过雾化喷涂技术在玻璃和掺氟氧化锡(FTO)基板上沉积四氧化三钴(Co3O4)薄膜。所指示的(311)平面的XRD图案对于所有膜而言都是主导的,与沉积温度无关。采用均匀变形模型(UDM),通过Williamson-Hall(W-H)分析来了解所制备的Co3O4膜在不同沉积温度下的应变变化。扫描电子显微镜图像显示了在623 K下制备的薄膜的多孔形态。光学参数,例如折射率(n),消光系数(k)和带隙,是从Co3O4薄膜的紫外可见光谱得出的。通过循环伏安法,计时库仑法,计时电流法和离子光学研究分析了沉积的Co3O4膜的电致变色性能。

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