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Tantalum Protective Thin Coating Techniques for the Chemical Process Industry: Molten Salts Electrocoating as a New Alternative

机译:化工行业的钽保护薄涂层技术:熔融盐电沉积作为新的选择

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摘要

A comparison of corrosion resistance and basic properties of solid tantalum with other high-performance materials used in the Chemical Process Industry (CPI) is given. The corrosive chemicals taken into consideration are strong acidic media. Secondly, it is pointed out that tantalum, which exhibits excellent corrosion resistance, owing to a rapid build-up of passivating protective film in oxidizing conditions, also has good mechanical, thermal and electrical properties which suggest its use when little or no metallic corrosion is tolerated. Thirdly, tantalum thin-layer, coated onto a usual base metal, which offers the same protection as solid metal and avoids its expensive use, is treated. Fourthly, numerous tantalum-coating techniques for clad-vessel and CPI devices are reviewed and compared. Amongst these coating techniques, this paper focuses mainly on two techniques which give a very thin, protective coating against corrosion. Thus, Chemical Vapor Deposition (CVD) and Molten Salt Electrodeposition (MSE) are especially enhanced. Finally, MSE which is still not widely used for manufacturing clad-vessels is examined in greater detail.
机译:给出了固态钽与化学过程工业(CPI)中使用的其他高性能材料的耐腐蚀性和基本性能的比较。考虑到的腐蚀性化学物质是强酸性介质。其次,要指出的是,由于在氧化条件下钝化保护膜的快速形成,钽具有极好的耐腐蚀性,它还具有良好的机械,热和电性能,建议在很少或没有金属腐蚀的情况下使用钽。宽容的。第三,处理涂覆在普通贱金属上的钽薄层,该钽薄层可提供与固态金属相同的保护作用,并且避免了昂贵的使用。第四,审查并比较了用于复合容器和CPI设备的多种钽涂层技术。在这些涂层技术中,本文主要关注两种技术,它们可提供非常薄的保护性涂层以防腐蚀。因此,化学气相沉积(CVD)和熔盐电沉积(MSE)尤其得到增强。最后,将对尚未广泛用于制造复合容器的MSE进行更详细的研究。

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