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首页> 外文期刊>International Journal of Refractory Metals & Hard Materials >Properties of nanostructured cubic boron nitride films prepared by the short-pulse laser plasma deposition techniques
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Properties of nanostructured cubic boron nitride films prepared by the short-pulse laser plasma deposition techniques

机译:短脉冲激光等离子体沉积技术制备的纳米立方立方氮化硼薄膜的性能

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摘要

Nanostructured cubic boron nitride (BN) films were synthesized on molybdenum substrates by using the short-pulse laser plasma deposition techniques. The surface morphologies, chemical compositions, bond structures, and mechanical properties of the obtained BN thin films have been investigated by scanning electron microscopy, Raman scattering, Fourier transform infrared spectroscopy (FTIR), energy dispersive spectra, and hardness measurements. High power density laser deposition yielded boron-rich BN nano-rod arrays where tBN component dominates. Reducing power density down to 8 X 10~7 W/cm~2 during laser plasma deposition produced flat cBN thin films. Typical TO and LO bands in the Raman and FTIR spectra of the cBN samples were identified. The cBN sample with hardness up to 40 GPa was obtained.
机译:利用短脉冲激光等离子体沉积技术在钼衬底上合成了纳米立方立方氮化硼(BN)薄膜。通过扫描电子显微镜,拉曼散射,傅立叶变换红外光谱(FTIR),能量色散谱和硬度测量研究了所得BN薄膜的表面形貌,化学组成,键结构和机械性能。高功率密度激光沉积产生了富含硼的BN纳米棒阵列,其中tBN成分占主导。在激光等离子体沉积过程中,将功率密度降低至8 X 10〜7 W / cm〜2,可得到平坦的cBN薄膜。在cBN样品的拉曼光谱和FTIR光谱中确定了典型的TO和LO带。获得了硬度高达40 GPa的cBN样品。

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