首页> 外国专利> Adherent cubic boron nitride layer production, especially for iron alloy machining tools or optical components, comprises initially depositing an adhesion promoting boron nitride layer by pulsed laser deposition

Adherent cubic boron nitride layer production, especially for iron alloy machining tools or optical components, comprises initially depositing an adhesion promoting boron nitride layer by pulsed laser deposition

机译:粘结立方氮化硼层的生产,特别是用于铁合金加工工具或光学组件的立方氮化硼层的生产,包括首先通过脉冲激光沉积来沉积促进粘合力的氮化硼层

摘要

An adherent cubic boron nitride layer is produced by initially depositing an adhesion promoting boron nitride layer by pulsed laser deposition. An adherent boron nitride layer system is produced by: (a) cleaning and activating a substrate or body surface by ion bombardment in a vacuum coating unit; (b) depositing an adhesion promoting boron nitride layer (1-BN layer) with amorphous to turbostratic crystalline structure onto the heated or unheated substrate or body surface by pulsed laser deposition either from a boron nitride target without ion bombardment in a nitrogen atmosphere, in a nitrogen plasma or with simultaneous nitrogen or nitrogen/noble gas ion bombardment of the growing layer or from a boron carbide or boron target with simultaneous nitrogen or nitrogen/noble gas ion bombardment of the growing layer; (c) effecting nucleation of a cubic boron nitride phase on this 1-BN layer by ion-enhanced pulsed laser deposition or by an ion- or plasma-enhanced coating process by ion bombardment of the growing layer surface using an incident ion/target atom ratio of greater than 1, low deposition rates and substrate or body surface temperatures above 150 deg C, preferably on a hexagonal boron nitride intermediate layer (h-BN layer) which has been initially grown on the 1-BN layer and which has its c-axis oriented parallel to the substrate or body surface; and (d) depositing a c-BN layer either with the same parameters as step (c) or at lower incident ion/target atom ratios and higher growth rates by means of ion-enhanced pulsed laser deposition, CVD or an ion- or plasma-enhanced coating process. An Independent claim is also included for the following: (i) adherent boron nitride layer systems produced by the above process; and (ii) use of ion-enhanced pulsed laser deposition for production of the above adherent boron nitride layer systems.
机译:通过首先通过脉冲激光沉积来沉积促进粘合的氮化硼层,来制造附着的立方氮化硼层。粘附的氮化硼层系统是通过以下方法生产的:(a)在真空镀膜装置中通过离子轰击清洁和活化基材或身体表面; (b)通过脉冲激光沉积从氮化硼靶材上在氮气氛中进行离子轰击,在不经离子轰击的情况下,将具有无定形至涡轮层状晶体结构的促进粘附的氮化硼层(1-BN层)沉积在加热或未加热的基板或身体表面上氮等离子体或同时对生长层进行氮或氮/稀有气体离子轰击,或来自碳化硼或硼靶,同时对生长层进行氮或氮/稀有气体离子轰击; (c)通过离子增强脉冲激光沉积或离子或等离子体增强涂层工艺,使用入射离子/目标原子对生长层表面进行离子轰击,在该1-BN层上实现立方氮化硼相的成核比率大于1,低沉积速率和150摄氏度以上的基板或体表温度,最好在六方氮化硼中间层(h-BN层)上进行,该中间层最初已在1-BN层上生长并且其c -平行于基材或身体表面定向的轴; (d)通过离子增强脉冲激光沉积,CVD或离子或等离子体沉积具有与步骤(c)相同的参数或以较低的入射离子/靶原子比和较高的生长速率沉积c-BN层-增强涂层工艺。还包括以下方面的独立权利要求:(i)通过上述方法生产的粘附氮化硼层系统; (ii)使用离子增强脉冲激光沉积来生产上述粘附的氮化硼层系统。

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