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Modeling of thin film growth on a tilted miscut substrate: Statistical properties and the optimum growth conditions

机译:倾斜的误切基材上薄膜生长的模型:统计特性和最佳生长条件

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摘要

Most studies of thin film growth simulations are performed on flat substrates. However, in reality, a substrate is usually miscut leading to a vicinal surface with a small tilt. The goal of this work is to study effects of an initial configuration of a miscut substrate on the grown film. The Das SarmaTamborenea model with modified diffusion rules is used for the simulations. The modification is done to allow variation in the surface diffusion length and mobility of adatoms. The results show that the optimum conditions that lead to step-flow growth are long diffusion length and small step height.
机译:薄膜生长模拟的大多数研究都是在平坦的基板上进行的。然而,实际上,基板通常被误切而导致具有小的倾斜度的邻近表面。这项工作的目的是研究错切基材的初始配置对生长的薄膜的影响。模拟使用了具有修正扩散规则的Das SarmaTamborenea模型。进行修饰以允许表面扩散长度和吸附原子迁移率的变化。结果表明,导致阶跃流增长的最佳条件是扩散长度长,阶跃高度小。

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