Crystal growth of epitaxially grown PbTiO{sub}3 thin films on miscut SrTiO{sub}3 substrate

摘要

Thin films of (001)PbTiO{sub}3 (PT), 5-260 nm thickness, were grown by sputtering on miscut (001)SrTiO{sub}3 (ST) substrate with miscut angle of 1.7° at 600℃. Although the sputtered PT thin films were deformed by the two dimensional compressiveforce due to the small lattice of ST substrate and showed large tetragonality of c/a = 1.7 at RT, i.e. c/a= 1.06 for bulk PT, the PT thin films showed a single domain-single crystal perovskite structure through a large area with extremely smooth surfaceon an atomic scale. The film growth was governed by a step-flow model showing a layer growth. It was found that the layer growth was stable at low oxygen partial pressure during the sputtering deposition.