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首页> 外文期刊>Annales de Chimie-Science des Materiaux >Benzene flow rate effect on the properties of carbon films deposited on plasma nitrided steel using the MW/ECR PACVD process
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Benzene flow rate effect on the properties of carbon films deposited on plasma nitrided steel using the MW/ECR PACVD process

机译:苯流速对采用MW / ECR PACVD工艺沉积在等离子氮化钢上的碳膜性能的影响

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Amorphous hydrogenated carbon a-c:H films often called DLC films were deposited on plasma nitrided layers of Z30C13 steel substrate using the Microwave Electron Cyclotron Resonance Plasma Assisted Chemical Vapour Deposition method with benzene/argon gas a precursor. The coatings were deposited on ferrite and (F) Fe2-3N at different temperatures: 623, 753 and 793 K for time intervals between 2 up to 120 min under different pressures ranging from 10(-3) to 10(-1) Pa. A wide range of thickness values of the amorphous carbon layers (0.4 up to 15 mum) was formed a function of the deposition conditions and precursors, when the bias voltage (-200V) and microwave power (300 W) were kept constant. However, pretreatments consisting in mechanical polishing down to a surface roughness Ra< 0.06 mum, with ultrasonic cleaning and plasma argon etching of the substrates before depositing were necessary for sufficient adhesion of the coating., For a gas mixture of benzene and argon with 10 sccm and 20 sccm flow rates, respectively, analysis by scanning electron microscopy (SEM) showed a poor adhesion and carbon films delamination. Nevertheless, the best adhesion of hard coatings to the nitrided layers was achieved when the benzene flow rate was reduced to 4 sccm. Scratch tests revealed that they possess excellent resistance strength (10 to 81 GPa) and exhibit both low values of coefficient of friction (0.03 to 0.3) and roughness (0.05-0.24 mum). The Improvement in the carbon films adhesion to the nitrided layers is seen from X-rays diffraction as due to an interlayer formed mainly of phases such as Cr-23 C-6, (Fe,Cr)(7)C-3, (Fe,Cr)(3)C and Cr3C2. [References: 21]
机译:使用微波电子回旋共振等离子体辅助化学气相沉积法,以苯/氩气为前驱物,将通常称为DLC膜的非晶氢化碳a-c:H膜沉积在Z30C13钢基底的等离子体氮化层上。涂层在10(-3)至10(-1)Pa的不同压力下,在2至120分钟之间的时间间隔内,在不同温度:623、753和793 K下沉积在铁氧体和(F)Fe2-3N上。当偏置电压(-200V)和微波功率(300 W)保持恒定时,非晶碳层的厚度范围很广(0.4到15um)是沉积条件和前驱物的函数。但是,为了使涂层具有足够的附着力,必须进行预处理,包括机械抛光至表面粗糙度Ra <0.06μm,并在沉积前对基板进行超声清洗和等离子氩蚀刻。对于苯和氩的气体混合物(10 sccm)通过扫描电子显微镜(SEM)分析分别以10和10sccm的流速显示出差的粘附性和碳膜分层。然而,当苯的流速降低到4 sccm时,可以实现硬涂层对氮化层的最佳粘合。划痕测试表明,它们具有出色的电阻强度(10至81 GPa),并且摩擦系数(0.03至0.3)和粗糙度(0.05-0.24 mum)均较低。从X射线衍射可以看出碳膜与氮化层的粘附性得到了改善,这是由于中间层主要由Cr-23 C-6,(Fe,Cr)(7)C-3,(Fe ,Cr)(3)C和Cr3C2。 [参考:21]

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