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TWO-DIMENSIONAL MODEL OF A DIRECT CURRENT GLOW DISCHARGE - DESCRIPTION OF THE ARGON METASTABLE ATOMS, SPATTERED ATOMS, AND IONS

机译:直接电流辉光放电的二维模型-氩亚稳原子,分散原子和离子的描述

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摘要

A two-dimensional model is presented that describes the behavior of argon metastable atoms, copper atoms, and copper ions in an argon direct. current glow discharge, in the standard cell of the VG9000 glow discharge mass spectrometer for analyzing flat samples. The model is combined with a previously developed model for the electrons, argon ions, and atoms in the same cell to obtain an overall picture of the glow discharge, The results of the present model comprise the number densities of the described plasma species, the relative contributions of different production and loss processes for the argon metastable atoms, the thermalization profile of the sputtered copper atoms, the relative importance of the different ionization mechanisms for the copper atoms, the ionization degree of copper, the copper ion-to-argon ion density ratio, and the relative roles of copper ions, argon ions, and atoms in the sputtering process. All these quantities are calculated for a range of voltages and pressures, Moreover, since the sticking coefficient of copper atoms on solid surfaces is not well-known in the literature, the influence of this parameter on the results is briefly discussed.
机译:提出了二维模型,该模型描述了氩气中氩亚稳原子,铜原子和铜离子的行为。当前的辉光放电,位于VG9000辉光放电质谱仪的标准单元中,用于分析扁平样品。该模型与先前开发的用于同一单元中电子,氩离子和原子的模型相结合,以获得辉光放电的整体图。本模型的结果包括所描述的等离子体种类的数量密度,相对产生和损失过程对亚稳氩原子的贡献,溅射铜原子的热化曲线,不同电离机制对铜原子的相对重要性,铜的电离度,铜离子对氩离子的密度比率,以及铜离子,氩离子和原子在溅射过程中的相对作用。所有这些量都是针对一定范围的电压和压力计算的。此外,由于铜原子在固体表面上的粘附系数在文献中并不为人所知,因此将简要讨论该参数对结果的影响。

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