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Mathematical modeling of a direct current glow discharge in argon.

机译:氩气中直流辉光放电的数学模型。

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摘要

A glow discharge is obtained by inserting two electrodes (cathode and anode) in a low pressure gas environment {dollar}(sim{dollar}100 Pa) and applying a high voltage between the electrodes {dollar}(sim{dollar}1 kV). It is a complex kind of plasma, consisting of different plasma species (different kinds of atoms, ions, excited atoms, electrons, ...) that can all collide with each other. Glow discharges are used for etching, deposition and modification of layers, e.g. in the microelectronics industry, as metal vapor lasers, and also as spectroscopic sources in analytical chemistry. In the latter case, the cathode is constructed out of the material to be analyzed. Due to the sputter-bombardment by gas species onto the cathode, cathode-atoms are released and enter the plasma, where they are subject to a range of collisions (especially ionizaton and excitation). Therefore, the plasma is filled with atoms, ions and photons, representative for the material to be analyzed, which makes it useful as source for a variety of spectrometric techniques.; In order to improve the results in these application fields, a good insight in the fundamental processes of the glow discharge plasma is desirable. In this work, we try to achieve this by mathematical modeling, i.e., calculation of the behavior of the different plasma species. A set of three-dimensional models (Monte Carlo and fluid models) has been developed for a direct current glow discharge in argon, used in analytical chemistry. The species described in the models, include the argon gas atoms, argon ions, fast argon atoms, metastable argon atoms, electrons, and sputtered atoms and corresponding ions. The models are coupled to each other by the interaction processes between the plasma species. The combined models are solved iteratively until final convergence is reached, in order to obtain an overall picture of the glow discharge.; Typical results of the models include the densities, fluxes and energy distributions of the different plasma species, the electric field and potential distribution throughout the discharge, information about collision processes of the species, and the crater profiles and etching rates as a result of sputtering at the cathode. The results are presented in the three-dimensional geometry of a typical glow discharge cell and at typical discharge conditions for the VG9000 glow discharge mass spectrometer. The influence of pressure and voltage on the results is investigated. Moreover, to test the validity of the models, the results are compared with available literature data and experimental observations (e.g. Langmuir probe measurements, laser induced fluorescence spectrometry, measurements of energy distributions of ions bombarding the cathode, etc.). In general, the good agreement between theoretical and experimental results illustrates that the models present a realistic picture of the glow discharge.; Furthermore, the three-dimensional modeling results are compared with results of one-dimensional models. It was found that the latter yield already a satisfactory description of the glow discharge, but the three-dimensional models can give additional information and are therefore a progress when a more complete description of the discharge is intended.; Finally, as a spin-off, the models are used to explain differences in relative sensitivity factors in glow discharge mass spectrometry.
机译:通过在低压气体环境(美元)(sim {美元} 100 Pa)中插入两个电极(阴极和阳极)并在电极{美元}(sim {美元} 1 kV)之间施加高压来获得辉光放电。它是一种复杂的等离子体,由不同的等离子体物种(不同种类的原子,离子,激发的原子,电子等)组成,它们可以相互碰撞。辉光放电被用于蚀刻,沉积和修饰层,例如层。在微电子工业中,作为金属蒸气激光器,以及作为分析化学中的光谱源。在后一种情况下,阴极由要分析的材料构成。由于气体种类的溅射轰击,阴极上的阴极原子被释放并进入等离子体,在等离子体中它们受到一定范围的碰撞(特别是电离和激发)。因此,等离子体充满了原子,离子和光子,代表了要分析的材料,这使其可以用作多种光谱技术的来源。为了改善在这些应用领域中的结果,需要对辉光放电等离子体的基本过程有深入的了解。在这项工作中,我们尝试通过数学建模(即计算不同血浆物种的行为)来实现这一目标。已经开发了一套三维模型(蒙特卡洛模型和流体模型),用于分析化学中的氩气直流辉光放电。模型中描述的物质包括氩气原子,氩离子,快氩原子,亚稳氩原子,电子,溅射原子和相应的离子。这些模型通过血浆物质之间的相互作用过程相互耦合。迭代地求解组合的模型,直到达到最终收敛为止,以便获得辉光放电的整体图。该模型的典型结果包括不同等离子体物质的密度,通量和能量分布,整个放电过程中的电场和电势分布,有关物质碰撞过程的信息以及由于在室温下溅射而产生的坑洼轮廓和蚀刻速率阴极。结果以VG9000辉光放电质谱仪的典型辉光放电室的三维几何结构和典型放电条件显示。研究了压力和电压对结果的影响。此外,为了测试模型的有效性,将结果与可用的文献数据和实验观察结果进行比较(例如Langmuir探针测量,激光诱导荧光光谱法,轰击阴极的离子能量分布的测量等)。总的来说,理论和实验结果之间的良好一致性说明,这些模型呈现出了辉光放电的逼真的图像。此外,将三维建模结果与一维模型的结果进行比较。已经发现,后者已经产生了对辉光放电的令人满意的描述,但是三维模型可以提供附加的信息,因此当打算对放电进行更完整的描述时,这是一个进步。最后,作为衍生工具,这些模型用于解释辉光放电质谱法中相对灵敏度因子的差异。

著录项

  • 作者

    Bogaerts, Annemie.;

  • 作者单位

    Universitaire Instelling Antwerpen (Belgium).;

  • 授予单位 Universitaire Instelling Antwerpen (Belgium).;
  • 学科 Chemistry Analytical.; Physics Fluid and Plasma.; Engineering Electronics and Electrical.
  • 学位 Ph.D.
  • 年度 1996
  • 页码 195 p.
  • 总页数 195
  • 原文格式 PDF
  • 正文语种 eng
  • 中图分类 化学;等离子体物理学;无线电电子学、电信技术;
  • 关键词

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