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Microsecond pulsed vevsus direct current glow discharge as ion sources for analytical glow discharge-time of flight mass spectrometry

机译:微秒脉冲内窥镜直流辉光放电作为离子源,用于飞行时间质谱分析辉光放电

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摘要

Investigations have been carried out into coupling a microsecond pulsed direct current glow discharge to a time-of-flight mass analyser (μs-GD-TOFMS), aiming at studying the effects of the pulse parameters on mass spectra for analytical applications, including signal intensities, crater shapes and sputtering rates of conducting samples. By comparing the results obtained in four model materials (stainless steel, zinc, brass and an aluminium matrix) using pulsed and continuous dc voltages, a strong reduction (3-6 times, depending of the matrix) of the sputtering processes for the pulsed mode has been observed. This can be associated to the low average power available in each period. Conversely, the high voltage reached in a pulse seems to enhance ion generation, allowing for a notable sensitivity increase (about 50 fold) compared with dc continuous voltage operation. Concerning the effect of operating parameters typical of pulsed sources, the repeller delay has been demonstrated to be a critical parameter in achieving good analytical signals.
机译:已经进行了将微秒脉冲直流辉光放电与飞行时间质量分析器(μs-GD-TOFMS)耦合的研究,旨在研究脉冲参数对质谱的影响,以进行分析应用,包括信号强度,火山口形状和导电样品的溅射速率。通过比较使用脉冲和连续直流电压在四种模型材料(不锈钢,锌,黄铜和铝基质)中获得的结果,脉冲模式的溅射过程大幅降低(3-6倍,具体取决于基质)已经观察到。这可能与每个周期中可用的低平均功率有关。相反,脉冲中达到的高压似乎增强了离子的产生,与直流连续电压操作相比,灵敏度显着提高(约50倍)。关于典型的脉冲源操作参数的影响,推斥极延迟已被证明是获得良好分析信号的关键参数。

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