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首页> 外文期刊>ACS applied materials & interfaces >High-Performance Visible-Blind Ultraviolet Photodetector Based on IGZO TFT Coupled with p-n Heterojunction
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High-Performance Visible-Blind Ultraviolet Photodetector Based on IGZO TFT Coupled with p-n Heterojunction

机译:高性能可见盲紫外光探测器,基于IGZO TFT与P-N异质结合

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摘要

A visible-blind ultraviolet (UV) photodetector was designed based on a three-terminal electronic device of thin-film transistor (TFT) coupled with two-terminal p-n junction optoelectronic device, in hope of combining the beauties of both of the devices together. Upon the uncovered back-channel surface of amorphous indium-gallium-zinc-oxide (IGZO) TFT, we fabricated PEDOT:PSS/SnOx/IGZO heterojunction structure, through which the formation of a p-n junction and directional carrier transfer of photogenerated carriers were experimentally validated. As expected, the photoresponse characteristics of the newly designed photodetector, with a photoresponsivity of 984 A/W at a wavelength of 320 nm, a UV-visible rejection ratio up to 3.5 X 10(7), and a specific detectivity up to 3.3 X 10(14) Jones, are not only competitive compared to the previous reports but also better than those of the pristine IGZO phototransistor. The hybrid photodetector could be operated in the off-current region with low supply voltages (0.1 V) and ultralow power dissipation (10 nW under illumination and similar to 0.2 pW in the dark). Moreover, by applying a short positive gate pulse onto the gate, the annoying persistent photoconductivity presented in the wide band gap oxide-based devices could be suppressed conveniently, in hope of improving the response rate. With the terrific photoresponsivity along with the advantages of photodetecting pixel integration, the proposed phototransistor could be potentially used in high-performance visible-blind UV photodetector pixel arrays.
机译:基于与双端子P-N结光电子的薄膜晶体管(TFT)的三端电子装置设计了可见盲紫外(UV)光电探测器,希望将两个装置的美女组合在一起。在非晶铟 - 镓 - 氧化锌(IGZO)TFT的未覆盖的后沟道表面上,我们制造了PEDOT:PSS / SNOX / IGZO异质结结构,通过该标记结构通过该载体的形成和光生载体的定向载体转移进行了实验验证。如预期的那样,新设计的光电探测器的光响应特性,光响应性为984A / W的波长为320nm,UV可见抑制比高达3.5×10(7),以及高达3.3 x的特定检测率10(14)琼斯与上一份报告相比,不仅竞争,而且比原始IGZO光电晶体管的竞争力更好。混合光电探测器可以在具有低电源电压(& 0.1V)和UltraLow功率耗散(在照明下的& 10nw和黑暗中的0.2 pW)中的截止电流区域中操作。此外,通过将短的正栅极脉冲施加到栅极上,可以方便地抑制在宽带隙氧化物的装置中呈现的令人讨厌的持久光电导性,希望能够改善响应速率。利用广泛的光响应性以及光电探测像素集成的优点,可以将所提出的光电晶体管潜在地用于高性能可见帘式UV光电探测器像素阵列。

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  • 作者单位

    Shanghai Univ Sch Mat Sci &

    Engn Shanghai 200444 Peoples R China;

    Chinese Acad Sci Ningbo Inst Mat Technol &

    Engn Key Lab Graphene Technol &

    Applicat Zhejiang Prov Ningbo 315201 Zhejiang Peoples R China;

    Chinese Acad Sci Ningbo Inst Mat Technol &

    Engn Key Lab Graphene Technol &

    Applicat Zhejiang Prov Ningbo 315201 Zhejiang Peoples R China;

    Shanghai Univ Sch Mat Sci &

    Engn Shanghai 200444 Peoples R China;

    Chinese Acad Sci Ningbo Inst Mat Technol &

    Engn Key Lab Graphene Technol &

    Applicat Zhejiang Prov Ningbo 315201 Zhejiang Peoples R China;

    Chinese Acad Sci Ningbo Inst Mat Technol &

    Engn Key Lab Graphene Technol &

    Applicat Zhejiang Prov Ningbo 315201 Zhejiang Peoples R China;

    Chinese Acad Sci Ningbo Inst Mat Technol &

    Engn Key Lab Graphene Technol &

    Applicat Zhejiang Prov Ningbo 315201 Zhejiang Peoples R China;

    Shanghai Univ Sch Mat Sci &

    Engn Shanghai 200444 Peoples R China;

    Natl Sun Yat Sen Univ Dept Phys Kaohsiung 80424 Taiwan;

    Chinese Acad Sci Ningbo Inst Mat Technol &

    Engn Key Lab Graphene Technol &

    Applicat Zhejiang Prov Ningbo 315201 Zhejiang Peoples R China;

  • 收录信息
  • 原文格式 PDF
  • 正文语种 eng
  • 中图分类 化学工业;
  • 关键词

    IGZO; transistors; p-n heterojunction; visible blind; UV photodetector;

    机译:IGZO;晶体管;P-N异质结;可见盲;UV光电探测器;

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