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首页> 外文期刊>Carbon: An International Journal Sponsored by the American Carbon Society >Background pressure does matter for the growth of graphene single crystal on copper foil: Key roles of oxygen partial pressure
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Background pressure does matter for the growth of graphene single crystal on copper foil: Key roles of oxygen partial pressure

机译:背景技术压力为石墨烯单晶在铜箔上生长:氧分压的关键作用

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摘要

Understanding the effect of minor elements such as oxygen and nitrogen on the growth of graphene is crucial to fabrication of graphene single crystals (GSC) with large grain size. In this study, we investigate the nucleation and growth behavior of graphene domains on commercial copper foils as a function of oxygen partial pressure in the chemical vapor deposition (CVD) chamber. To achieve repeatable fabrication of GSC, it is essential to backfill CVD chamber with moderate amount of oxygen during substrate annealing and graphene growth stages. In another words, the relatively higher background pressure in CVD chamber is beneficial to the fabrication of GSC. In addition to reducing the nucleation density of graphene grains, the backfilled oxygen induces (111) reconstruction of copper foil upon annealing at 1050 degrees C for 2 h. The oxygen-induced crystallinity of copper substrate should account for the growth of hexagonal-shaped GSC of millimeter-scale on commercial copper foil with single layer nature. (C) 2018 Elsevier Ltd. All rights reserved.
机译:了解少数元素如氧气和氮气对石墨烯生长的影响对于制造具有大粒度的石墨烯单晶(GSC)至关重要。在这项研究中,我们研究了石墨烯域对商业铜箔的成核和生长行为,作为化学气相沉积(CVD)室中的氧分压的函数。为了实现GSC的可重复制造,在衬底退火和石墨烯生长阶段期间将CVD室具有中等量的氧气回填。在另一个词中,CVD室中的相对较高的背景压力有利于GSC的制造。除了降低石墨烯颗粒的成核密度之外,回填的氧气诱导(111)在1050℃下退火时重建铜箔2小时。铜基材的氧气诱导的结晶度应考虑用单层性质的商业铜箔毫米尺度的六边形GSC的生长。 (c)2018年elestvier有限公司保留所有权利。

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