...
首页> 外文期刊>Chemical Weekly >Atomic tuning on cobalt enables an eightfold increase of hydrogen peroxide production
【24h】

Atomic tuning on cobalt enables an eightfold increase of hydrogen peroxide production

机译:钴上的原子调整能够增加过氧化氢生产的八倍

获取原文
获取原文并翻译 | 示例

摘要

Just like we take a shower to wash away all the dirt and other particles, semiconductors also require a cleaning process. However, its cleaning goes extreme to make even trace contaminants "leave no trace." After all the chip fabrication materials are applied to a silicon wafer, a strict cleaning process is taken to remove residual particles. If this high-purity cleaning and particle-removal step goes wrong, the electrical connections in the chip are likely to suffer from it. With ever-miniaturized gadgets on the market, the purity standards of the electronics industry reach to a level, like finding a needle in a desert.
机译:就像我们洗澡就像洗掉所有污垢和其他颗粒一样,半导体也需要清洁过程。 然而,它的清洁是极端的,以使甚至跟踪污染物“留下没有痕迹”。 在将所有芯片制造材料施加到硅晶片之后,采用严格的清洁过程去除残留颗粒。 如果这种高纯度清洁和粒子移除步骤出错,则芯片中的电气连接可能会受到它。 随着市场上的不断小型小工具,电子行业的纯度标准达到一个水平,就像在沙漠中寻找针一样。

著录项

相似文献

  • 外文文献
  • 中文文献
  • 专利
获取原文

客服邮箱:kefu@zhangqiaokeyan.com

京公网安备:11010802029741号 ICP备案号:京ICP备15016152号-6 六维联合信息科技 (北京) 有限公司©版权所有
  • 客服微信

  • 服务号