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Effect of oxygen pressure on the p-type conductivity of Ga, P co-doped ZnO thin film grown by pulsed laser deposition

机译:氧气压力对脉冲激光沉积的Ga,P掺杂ZnO薄膜的p型导电性的影响

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The effect of the oxygen partial pressure on the conductivity of (Ga, P) co-doped ZnO thin films (ZnO:Ga0.01P0.02, ZnO:Ga0.01P0.04) was investigated. The thin films were grown by using the pulsed laser deposition (PLD) method. As the oxygen partial pressure increased from 1 mTorr to 200 mTorr, the electron carrier concentration of the ZnO:Ga0.01P0.04 thin films decreased. Above 200 mTorr, however, the electron carrier concentration increased and a transition from n-type to p-type conductivity was observed. On the other hand, in the case of the ZnO: Ga0.01P0.02 thin films, their electron carrier concentration continuously decreased as the oxygen partial pressure increased from 1 to 500 mTorr, showing the typical n-type semi-conductive characteristics. The X-ray photoelectron spectroscopy (XPS) and secondary ion mass spectroscopy (SIMS) analyses were used to characterize the n-type to p-type conductivity transitions with increasing oxygen partial pressure. (C) 2015 Elsevier Ltd and Techna Group S.r.l. All rights reserved.
机译:研究了氧分压对(Ga,P)共掺杂ZnO薄膜(ZnO:Ga0.01p0.02,ZnO:Ga0.01p0.04)的电导率的影响。通过使用脉冲激光沉积(PLD)方法生长薄膜。随着氧分压从1毫尿至200 mtorr增加,ZnO:Ga0.01p0.04的电子载体浓度降低。然而,在200mTorr以上,电子载体浓度增加并且观察到从n型转变为p型导电性。另一方面,在ZnO:Ga0.01P0.02薄膜的情况下,随着氧分压从1至500 mTorr增加,它们的电子载体浓度连续降低,显示出典型的n型半导体特性。 X射线光电子能谱(XPS)和二次离子质谱(SIMS)分析用于表征N型与氧分压增加的p型电导率转变。 (c)2015 Elsevier Ltd和Techna Group S.R.L.版权所有。

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