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Sub-1 V band-gap based and MOS threshold-voltage based voltage references in 0.13 A mu m CMOS

机译:0.13 AμmCMOS中基于1V以下带隙和基于MOS阈值电压的电压基准

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摘要

Portable and implantable device applications require low supply voltage reference circuits due to increasing trend for lower power requirements. Voltage references have been proposed for operation below 1 V for CMOS and a comprehensive analysis of the behavior of the different topologies is needed for ultra-low power designs, in order to select the right circuit topology for a given requirement. This work compares two major classes of voltage reference topologies: threshold voltage (V-T0)-based and (V-G0) bandgap voltage-based reference circuits. Four different topologies of voltage-reference designs with 1-V supply were designed and fabricated in 130 nm CMOS process. Monte Carlo analysis shows the variability of the references and of their temperature coefficients (TC), and the results are compared to measured samples. Simulations and measurements show that the threshold voltage-based references are more susceptible to the variations in the CMOS fabrication process.
机译:便携式和可植入设备的应用需要低电源电压基准电路,这是由于较低功率要求的增长趋势。已经提出了用于CMOS的低于1 V的工作电压基准,并且对于超低功耗设计,需要对不同拓扑的行为进行全面分析,以便为给定要求选择正确的电路拓扑。这项工作比较了两种主要的电压基准拓扑:基于阈值电压(V-T0)和基于(V-G0)带隙电压的基准电路。采用130 V CMOS工艺设计和制造了具有1-V电源的电压基准设计的四种不同拓扑。蒙特卡洛分析显示参考物及其温度系数(TC)的可变性,并将结果与​​测量样品进行比较。仿真和测量表明,基于阈值电压的基准更容易受到CMOS制造工艺中的变化的影响。

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