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首页> 外文期刊>Current applied physics: the official journal of the Korean Physical Society >Fabrication and characteristics of a surface acoustic wave UV sensor based on ZnO thin films grown on a polycrystalline 3C-SiC buffer layer
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Fabrication and characteristics of a surface acoustic wave UV sensor based on ZnO thin films grown on a polycrystalline 3C-SiC buffer layer

机译:基于在多晶3C-SiC缓冲层上生长的ZnO薄膜的表面声波UV传感器的制备和特性

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摘要

Zinc oxide (ZnO) thin films were deposited onto a polycrystalline (poly) 3C-SiC buffer layer for surface acoustic wave (SAW) ultraviolet (UV) sensing using a magnetron sputtering system. X-ray diffraction (XRD) and photoluminescence (PL) spectra showed that the ZnO film grown on 3C-SiC/Si had a dominant c-axis orientation, a lower residual stress, and higher intensity of luminescence at 380 nm of ZnO thin film. The SAW resonator UV detector were fabricated on ZnO/Si structures with a 3C-SiC buffer layer. The SAW resonator exposed under UV illumination had a linear response with sensitivity of 85 Hz/(μW/cm~2) in ZnO/3C-SiC/Si structures, as compared to 25 Hz/(μW/cm~2) in ZnO/Si structures with UV intensity varied until 600 μW/cm~2.
机译:氧化锌(ZnO)薄膜沉积到多晶(poly)3C-SiC缓冲层上,用于使用磁控溅射系统感测声表面波(SAW)紫外线(UV)。 X射线衍射(XRD)和光致发光(PL)光谱表明,在3C-SiC / Si上生长的ZnO薄膜具有主要的c轴取向,较低的残余应力和380nm的ZnO薄膜的较高的发光强度。 。 SAW谐振器紫外线检测器是在具有3C-SiC缓冲层的ZnO / Si结构上制造的。在ZnO / 3C-SiC / Si结构中,暴露于UV照射下的SAW谐振器具有线性响应,灵敏度为85 Hz /(μW/ cm〜2),而在ZnO / 3C中为25 Hz /(μW/ cm〜2)紫外强度的Si结构一直变化到600μW/ cm〜2。

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