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Scalable Fabrication of High-Performance NO2 Gas Sensors Based on Tungsten Oxide Nanowires by On-Chip Growth and RuO2-Functionalization

机译:通过片上生长和RuO2功能化可扩展地制造基于氧化钨纳米线的高性能NO2气体传感器

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The on-chip growth and surface-functionalization have been recently regarded as promising techniques for large-scale fabrication of high performance nanowires gas sensors. Here we demonstrate a good NO2 gas-sensing performance of the tungsten oxide nanowires (TONWs) sensors realized by scalable on-chip fabrication and RuO2-functionalization. The gas response (R_g/R_a) of the RuO2- functionalized TONWs to 5 ppm of NO2 was 186.1 at 250 °C, which increased up to ~18.6-fold compared with that of the bare TONWs. On the contrary, the responses of the bare and functionalized sensors to 10 ppm of NH3, 10 ppm of H2S and 10 ppm of CO gases were very low of about 1.5, indicating the good selectivity. In addition, the TONW sensors fabricated by the on-chip growth technique exhibited a good reversibility up to 7 cycles switching from air-to-gas with a response of 19.8 ± 0.033 (to 1 ppm of NO2), and this value was almost the same (about 19.5 ± 0.027) for 11 cycles after three months storage in laboratory condition. The response and selectivity enhancement of RuO2-ninctionalzied TONWs sensors was attributed to the variation of electron depletion layer due to the formation of RuO2/TONWs Schottky junctions and/or the promotion of more adsorption sites for NO2 gas molecule on the surface of TONWs, whereas the good reversibility was attributed to the formation of the stable monoclinic WO3 from the single crystal of monoclinic W_(18)O_(49) after annealing at 600 °C.
机译:片上生长和表面功能化最近已被认为是用于大规模制造高性能纳米线气体传感器的有前途的技术。在这里,我们展示了可扩展的芯片制造和RuO2功能化实现的氧化钨纳米线(TONWs)传感器的良好的NO2气敏性能。在250°C下,RuO2-官能化TONW对5 ppm NO2的气体响应(R_g / R_a)为186.1,与裸色TONW相比,增加到〜18.6倍。相反,裸露的和功能化的传感器对10 ppm的NH3、10 ppm的H2S和10 ppm的CO气体的响应非常低,约为1.5,表明具有良好的选择性。此外,通过片上生长技术制造的TONW传感器在从空气到气体的最多7个循环中显示出良好的可逆性,响应值为19.8±0.033(至2 ppm的NO 2),几乎是在实验室条件下存放三个月后,进行11个周期的测试(约19.5±0.027)。 RuO2取代的TONWs传感器的响应和选择性增强归因于RuO2 / TONWs肖特基结的形成和/或促进了TONWs表面NO2气体分子的更多吸附位,从而导致电子耗尽层的变化。良好的可逆性归因于在600°C退火后由单斜晶W_(18)O_(49)的单晶形成稳定的单斜晶WO3。

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