Oxygen containing hard amorphous carbon thin films by plasma pulsed deposition method

摘要

Hard amorphous carbon thin films containing smallamounts of oxygen were deposited by the radio frequency (13.56MHz) self-bias method, using isopropanol as a starting material.The effect of the deposition temperature and the behavior ofoxygen atoms during the film depositions were investigated indetail with controlling the deposition temperature by the plasmapulsed deposition technique. As a result, the deposition ratesdecreased by about 50% as compared with the diamond-likecarbon film depositions from isobutane, because deoxygenationreactions from the films actively progressed. The effect of thedeposition temperature was almost similar to that found in thediamond-like carbon film depositions but, an increase in the filmdensity and a decrease of the film surface micro-roughness wererecognized. The deposited films were considered to consist of athree-dimensional network structure of carbon chains, withinwhich carbonyl structures and graphite-like carbon clusters wereintermixed. Furthermore, as the film formation ability of theapplied deposition method in this study was exceedingly high, C =C = 0 structures in the deposited films were observed by FT-IRspectroscopy, which was considered to be the precursors for thedeoxygenation reactions from the films.