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Nb doped SnO{sub}2 transparent conductive oxide films for analog type touch panels

机译:Nb掺杂SnO {Sub} 2用于模拟类型触摸板的透明导电氧化物薄膜

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摘要

We have studied Nb doped SnO{sub}2 transparent conductive film for analog type touch panel. An analog type touch panel does not necessitate the etching of transparent electrode. Therefore, chemically stable SnO{sub}2 film can be applied for its electrode. Nb doped SnO{sub}2 film were made under conditions of deposition temperature at 200°C or 300°C, anneal temperature of 300°C or 400°C by r.f. magnetron sputtering. Resisitivities ranging between 7×10{sup}(-3)~3×10{sup}(-2) Ωcm and transmittance of more than 90% at 550nm were obtained. Further it was found that the mechanical properties such as abrasion resistance, adhesion strength and hardness are superior to those of ITO film.
机译:我们研究了Nb掺杂的SnO {Sub} 2透明导电膜进行了模拟型触摸面板。 模拟型触摸面板不需要蚀刻透明电极。 因此,可以施加化学稳定的SnO {Sub} 2膜。 Nb掺杂的SnO {Sub} 2薄膜在沉积温度的条件下在200℃或300℃,400℃的退火温度或400℃下进行R.F。 磁控溅射。 获得了7×10 {sup}( - 3)〜3×10 {sup}( - 2)ωcm和在550nm下的透射率为90%以上的重振。 此外,发现诸如耐磨性,粘合强度和硬度的机械性能优于ITO膜的机械性能。

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