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首页> 外文期刊>Journal of Tribology >On the Planarization Mechanism and Pad Aging Effects of Soft Pad Polishing: A Perspective From the Micro-Mechanical Properties of Soft Pads
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On the Planarization Mechanism and Pad Aging Effects of Soft Pad Polishing: A Perspective From the Micro-Mechanical Properties of Soft Pads

机译:软垫抛光的平坦化机理和垫老化效应:软垫微机械性能的视角

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摘要

The local viscoelastic properties of soft polishing pads with different usage durations are measured by a micro-scale mechanical analysis testing platform. The testing reveals stimulus-adaptive local viscoelasticity of soft pads under the activation of asperity contact. This phenomenon suggests asperity-dependent local modulus. Such an increase of local modulus induced by higher asperity provides a further enhancement effect to the planarization of surface asperity. Furthermore, the measurement outcomes suggest that the reaction of local micro-scale viscoelastic properties of the soft pad surface to the workpiece asperity will decay with usage time. The current study provides a detailed understanding of the aging effects for the soft pad and explains the performance decay during soft pad polishing from a local micro-scale interfacial perspective.
机译:通过微尺度机械分析测试平台测量具有不同使用持续时间的软抛光垫的局部粘弹性。 该测试显示在粗糙接触的激活下软垫的刺激自适应局部粘弹性。 这种现象表明依赖于抑制的局部模量。 通过较高粗糙诱导的局部模量的这种增加为表面粗糙的平坦化提供了进一步的增强效果。 此外,测量结果表明,软垫表面的局部微级粘弹性的反应与工件粗糙度的反应将衰减使用时间。 目前的研究规定了对软垫的老化效果的详细了解,并从局部微级界面角度解释软垫抛光期间的性能衰减。

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