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首页> 外文期刊>Journal of Materials Engineering and Performance >Investigation on Target Erosion and Effect of Deposition Rate on Microstructure and Properties of Sputtered Be Coating
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Investigation on Target Erosion and Effect of Deposition Rate on Microstructure and Properties of Sputtered Be Coating

机译:对溅射微观结构沉积速率的目标侵蚀和沉积速率的研究

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The beryllium coatings were prepared by direct current magnetron sputtering at different powers. The target erosion rate was theoretically predicted on the basis of the conservation of electric charge and mass. The experiment based on weighing method was performed, which verified the theoretical prediction. XRD analysis reveals that the sputter coatings mainly consist of alpha-Be phase. On increasing deposition rates, the surface morphology shows a transition from a regular equiaxed grain to a cauliflower-like polygrain owing to the irregular arrangement of atoms and bulk diffusion enhancement originating from the sputtering thermal effect. A heterogeneous particulate-induced growth was observed and derived from fallen scrap during the sputtering process. The surface roughness displays a power function with the thickness increment, while the electrical resistivity is reversed with the grain size.
机译:通过在不同功率下直接电流磁控溅射制备铍涂层。 理论上,基于电荷和质量的保护,理论上预测了目标侵蚀率。 进行了基于称重方法的实验,验证了理论预测。 XRD分析表明,溅射涂层主要由α-相位组成。 由于沉积速率的增加,表面形态显示出由于原子的不规则排列和源自溅射热效应的原子的不规则排列而从常规等式的谷物到花椰菜状晶粒的过渡。 在溅射过程中观察到异质颗粒状诱导的生长并从下落的废料中衍生。 表面粗糙度显示具有厚度增量的功率功能,而电阻率随晶粒尺寸反转。

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