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The influence of target erosion grade in the optoelectronic properties of AZO coatings growth by magnetron sputtering

机译:靶腐蚀等级对磁控溅射AZO涂层光电性能的影响

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摘要

Aluminum-doped zinc oxide (AZO) transparent conductor coating has emerged as promising substitute to tin-doped indium oxide (ITO) as electrode in optoelectronic applications such as photovoltaics or light emitting diodes (LEDs). Besides its high transmission in the visible spectral region and low resistivity, AZO presents a main advantage over other candidates such as graphene, carbon nanotubes or silver nanowires; it can be deposited using the technology industrially implemented to manufacture ITO layers, the magnetron sputtering (MS). This is a productive, reliable and green manufacturing technique. But to guarantee the robustness, reproducibility and reliability of the process there are still some issues to be addressed, such as the effect and control of the target state. In this paper a thorough study of the influence of the target erosion grade in developed coatings has been performed. AZO films have been deposited from a ceramic target by RF MS. Structure, optical transmittance and electrical properties of the produced coatings have been analyzed as function of the target erosion grade. No noticeable differences have been found neither in optoelectronic properties nor in the structure of the coatings, indicating that the RF MS is a stable and consistent process through the whole life of the target. (C) 2016 Elsevier B.V. All rights reserved.
机译:铝掺杂的氧化锌(AZO)透明导体涂层已成为有前途的替代锡掺杂的氧化铟(ITO)的有希望的替代材料,在光电应用中用作电极,例如光伏或发光二极管(LED)。除了在可见光谱范围内的高透射率和低电阻率外,AZO还具有优于其他候选材料(例如石墨烯,碳纳米管或银纳米线)的主要优势。可以使用工业上用于制造ITO层的技术(磁控溅射(MS))进行沉积。这是一种高效,可靠和绿色的制造技术。但是,为了保证过程的鲁棒性,可重复性和可靠性,仍然需要解决一些问题,例如目标状态的影响和控制。在本文中,已对目标腐蚀等级对已开发涂层的影响进行了深入研究。已经通过RF MS从陶瓷靶沉积了AZO膜。已经分析了所产生涂层的结构,透光率和电性能与目标腐蚀等级的关系。在光电性能和涂层结构上均未发现明显差异,这表明RF MS在靶材的整个寿命过程中都是稳定且一致的过程。 (C)2016 Elsevier B.V.保留所有权利。

著录项

  • 来源
    《Applied Surface Science》 |2016年第1期|218-222|共5页
  • 作者单位

    IK4 Tekniker, Res Ctr, C Inanki Goenaga 5, Eibar 20600, Guipuzkoa, Spain;

    IK4 Tekniker, Res Ctr, C Inanki Goenaga 5, Eibar 20600, Guipuzkoa, Spain;

    IK4 Tekniker, Res Ctr, C Inanki Goenaga 5, Eibar 20600, Guipuzkoa, Spain;

    IK4 Tekniker, Res Ctr, C Inanki Goenaga 5, Eibar 20600, Guipuzkoa, Spain;

    Univ Nova Lisboa, Fac Sci & Technol, Dept Mat Sci, CENIMAT i3N, P-1200 Lisbon, Portugal;

    Univ Nova Lisboa, Fac Sci & Technol, Dept Mat Sci, CENIMAT i3N, P-1200 Lisbon, Portugal;

    Univ Nova Lisboa, Fac Sci & Technol, Dept Mat Sci, CENIMAT i3N, P-1200 Lisbon, Portugal;

  • 收录信息
  • 原文格式 PDF
  • 正文语种 eng
  • 中图分类
  • 关键词

    AZO; Ceramic target; Magnetron sputtering; Target erosion; Grade; Optoelectronics;

    机译:偶氮;陶瓷靶;磁控溅射;靶腐蚀;梯度;光电;

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