磁控溅射制备AZO/Al/GLASS双层膜的光电性能研究

摘要

Al film on glass was prepared by radio frequency magnetron sputtering,and the AZO film was prepared on the Al film to improve its stability.The effect of Al film thickness on the electrical and optical properties of AZO films has been studied.Results show that the AZO/Al/glass bi-layer films have the highest figure of merit of 26.68× 10-6 Ω-1,with the lowest sheet resistance of 500Ω/sq and the highest average transmittance in the visible sepectral region of 64.95％ when the thickness of Al films is 7 nm.%利用射频反应磁控溅射法在玻璃基片上制备Al薄膜,并在Al膜的表面镀上一层AZO薄膜,通过在Al膜表面镀上一层薄的AZO薄膜以提高其稳定性.并研究AZO/Al/glass双层膜的光电性能,以及Al薄膜层厚度对薄膜光电性能的影响.实验结果表明,当铝膜厚度为7 nm时,AZO/Al/glass双层膜品质因子最佳,为26.68×10-6Ω-1,此时方块电阻最低,为500 Ω/sq,可见光区的平均透过率最高,为64.95％.