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首页> 外文期刊>Journal of Materials Chemistry, C. materials for optical and electronic devices >A vertically layered MoS2/Si heterojunction for an ultrahigh and ultrafast photoresponse photodetector
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A vertically layered MoS2/Si heterojunction for an ultrahigh and ultrafast photoresponse photodetector

机译:用于超高压和超快光蚀刻光电探测器的垂直分层MOS2 / SI异质结

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摘要

Recently, vertically oriented few-layer 2D materials prepared by chemical vapor deposition (CVD) have attracted much attention due to their attractive properties. However, the integration of these materials as heterojunctions in optoelectronic sensors has been rarely reported. In this paper, large-area, high crystalline quality, and vertically oriented few-layered MoS2 (V-MoS2) nanosheets were synthesized and transferred successfully onto a silicon substrate to form a V-MoS2/Si heterojunction photodetector. The photodetector exhibits high photoelectric performances in a wide broadband ranging from visible to near-infrared with a photoresponsivity of up to 908.2 mA W-1, and a detectivity of up to 1.889 x 10(13) Jones. More importantly, an unprecedented response speed of (rise time similar to 56 ns, fall time similar to 825 ns) was found in the photodetector by time response measurements, which is the best result achieved so far in any other 2D-based photodetectors or phototransistors. These excellent performances can be ascribed to the strong light absorption and the quick longitudinal intralayer carrier transport speed of the V-MoS2 nanosheets as well as the good heterojunction formed between V-MoS2 and Si. This intriguing vertical oriented structure in combination with both ultrafast time response and ultrahigh detectivity in the V-MoS2/Si heterojunction provide great potential for application in optoelectronic devices.
机译:最近,由于化学气相沉积(CVD)制备的垂直导向的几层2D材料由于其有吸引力而引起了很多关注。然而,很少报道这些材料作为光电传感器中的异质功能的整合。在本文中,在硅衬底上合成并转移到硅衬底上以形成大面积,高晶体质量和垂直定向的少数层MOS2(V-MOS2)纳米晶片以形成V-MOS2 / Si异质结光电探测器。光电探测器在宽宽带中表现出高光电性能,从可见的近红外线,光响应性高达908.2 mA W-1,以及高达1.889 x 10(13)琼斯的探测器。更重要的是,在光电探测器中发现了前所未有的(上升时间,类似于56ns,类似于825ns的时间)的前所未有的响应速度,这是在任何其他2d基光电探测器或光电晶体管中实现的最佳结果。这些优异的性能可以归因于V-MOS2纳米片的强光吸收和快速的纵向纵向载波传输速度以及在V-MOS2和Si之间形成的良好异质结。这种有趣的垂直定向结构与V-MOS2 / Si异质结中的超快时间响应和超高探测率组合,可提供在光电器件中应用的巨大潜力。

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    Hebei Univ Coll Phys Sci &

    Technol Hebei Key Lab Opt Elect Informat &

    Mat Baoding 071002 Peoples R China;

    Hebei Univ Coll Phys Sci &

    Technol Hebei Key Lab Opt Elect Informat &

    Mat Baoding 071002 Peoples R China;

    Hebei Univ Coll Phys Sci &

    Technol Hebei Key Lab Opt Elect Informat &

    Mat Baoding 071002 Peoples R China;

    Hebei Univ Coll Phys Sci &

    Technol Hebei Key Lab Opt Elect Informat &

    Mat Baoding 071002 Peoples R China;

    Hebei Univ Coll Phys Sci &

    Technol Hebei Key Lab Opt Elect Informat &

    Mat Baoding 071002 Peoples R China;

    Hebei Univ Coll Phys Sci &

    Technol Hebei Key Lab Opt Elect Informat &

    Mat Baoding 071002 Peoples R China;

    Chinese Acad Sci Beijing Inst Nanoenergy &

    Nanosyst Beijing 100083 Peoples R China;

    Hebei Univ Coll Phys Sci &

    Technol Hebei Key Lab Opt Elect Informat &

    Mat Baoding 071002 Peoples R China;

    Chinese Acad Sci Beijing Inst Nanoenergy &

    Nanosyst Beijing 100083 Peoples R China;

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  • 原文格式 PDF
  • 正文语种 eng
  • 中图分类 物理化学(理论化学)、化学物理学;
  • 关键词

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