Super Resolution Surface Plasmon Nanolithography with Larger Period Mask by Oblique Illuminations

摘要

A super resolution surface plasmon nanolithography with a dielectric-metal multilayers metamaterial structure and larger period mask by oblique illuminations is presented in this paper. Compared to the normal illumination case, a larger period mask can be used to generate the super resolution interference lithography patterns with the same dimensions by the aid of horizontal direction momentum components of the working wavelength. The relationship of the illumination angle and the mask's period is also discussed. As an example, we numerically demonstrate that pattern with half pitch down to 18 nm can be obtained by a 216 nm period mask under 193 nm light oblique illuminations.