机译:SiCL4氢化SiCl4-H-2系统中SiHCl3和SiCl4的平衡浓度为SiHCL
Kunming Univ Sci &
Technol State Key Lab Complex Nonferrous Met Resources Cle Kunming 650093 Yunnan Peoples R China;
Kunming Univ Sci &
Technol State Key Lab Complex Nonferrous Met Resources Cle Kunming 650093 Yunnan Peoples R China;
Kunming Univ Sci &
Technol Fac Met &
Energy Engn Kunming 650093 Yunnan Peoples R China;
Kunming Univ Sci &
Technol State Key Lab Complex Nonferrous Met Resources Cle Kunming 650093 Yunnan Peoples R China;
Kunming Univ Sci &
Technol State Key Lab Complex Nonferrous Met Resources Cle Kunming 650093 Yunnan Peoples R China;
Kunming Univ Sci &
Technol Fac Met &
Energy Engn Kunming 650093 Yunnan Peoples R China;
Kunming Univ Sci &
Technol State Key Lab Complex Nonferrous Met Resources Cle Kunming 650093 Yunnan Peoples R China;
Thermodynamics; SiCl4 Residual Ratio; SiHCl3 Yield Ratio; Hydrogenation; Siemens Process;
机译:SiCL4氢化SiCl4-H-2系统中SiHCl3和SiCl4的平衡浓度为SiHCL
机译:由SiHCl3,SiCl4和H2制造多晶硅的热力学分析☆
机译:SiCl 4 sub> –H 2 sub>加氢中的SiHCl 3 sub>和SiCl 4 sub>的平衡浓度4 sub>转换为SiHCl 3 sub>
机译:使用MTS / H2检查SiC-CVD工艺中的SiCl4添加效果
机译:统计力学的密度泛函理论:平衡空位浓度和多分散系统中的冻结。
机译:SiCl4流量对SiCl4-BCl3-NH3-H2-Ar环境中SiBN沉积动力学的影响
机译:高SIHCL3浓度的纤薄垂直气体通道的优点对于大气压硅外延生长
机译:主族元素的吡咯基化合物。 II。 (n1-C4H4N)4si的晶体和分子结构以及C4H4NLi与siHCL3的反应