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首页> 外文期刊>Diamond and Related Materials >Adherent HFCVD diamond on steels substrates using vanadium carbide intermediate layer
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Adherent HFCVD diamond on steels substrates using vanadium carbide intermediate layer

机译:使用碳化钒中间层的钢材基材上的粘附HFCVD金刚石

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摘要

Investigations on CVD diamond deposition on steels for high performance tools development persisted over years. Literature makes out the need for an intermediate layer to improve adhesion and film quality. This work studied Thermo Diffused Vanadium Carbide (TDVC) coating deposited on AISI 01 steel by thermo reactive diffusion (TRD). Thick TDVC layers formed by varying the thermo diffusion time from 1 h to 12 h. Hot Filament Chemical Vapor Deposition reactor (HFCVD) growth conditions variation made possible diverse diamond films growth, from ultrananocrystalline to microcrystalline. X-ray diffraction, scanning electron microscopy with a field emission gun (FEG-SEM) and Raman spectroscopy were the characterization techniques used. The TDVC coating showed up as an excellent diffusional barrier and, also, a compressive stress reliever. The thicker high quality and adherent HFCVD diamond film grown over the TDVC had a thickness of 3 gm. A TDVC cross-section of 35 gm thickness could effectively mitigate diamond residual thermal compressive stress state after cooling.
机译:对高性能工具开发钢材CVD金刚石沉积的调查持续多年。文献使中间层的需要提高粘附和薄膜质量。通过热反应扩散(TRD)研究了该工作研究了沉积在AISI 01钢上的热扩散碳化物(TDVC)涂层。通过从1小时至12小时改变热扩散时间来形成厚的TDVC层。热长丝化学气相沉积反应器(HFCVD)生长条件变化使得可能不同的金刚石薄膜生长,从超晶体中生长到微晶。 X射线衍射,扫描电子显微镜与场发射枪(FEG-SEM)和拉曼光谱是所使用的表征技术。 TDVC涂层显示为优异的扩散屏障,并且还呈现压缩应力释放。在TDVC上生长的厚度高质量和粘附的HFCVD金刚石膜的厚度为3克。 TDVC横截面为35克厚度可以有效地减轻冷却后的金刚石残留热压缩应力状态。

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