In situ method for improving the adhesion of DLC Films deposited on Carbide Diamond Steels using Hard Coatings w / toilet as Intermediate layers

摘要

The present Invention relates to a method of in situ deposition of Multilayer Hard Coatings w / toilet / DLC (Tungsten Carbide / Tungsten Carbide / Diamond Like Carbon) by the method of PVD (Physical Vapor Deposition) reactive sputtering assisted by Magnetic Field (magnetron sputtering) from a single Binary White circular TUNGSTEN (99.99%) and carbon (99.99%).The deposition of the Multilayer w / toilet / DLC from this Single White binary is obtained with the gradual variation of the percentage of CH4 (Methane) in the mixture AR / CH4 (argon / Methane) that INtroduce is generated in the Chamber where the plasma Glow Discharge that leads to the deposition of multilayers.This method produces an improvement in the adhesion of DLC to Steel Substrates using Films of W / toilet as Intermediate layers.