Installation for thin film deposition of diamond-like carbon steel substrates or hardened metal and corresponding method in situ using hard coatings of metal / metal carbide such as intermediate layers for improving adhesion between film.

摘要

Installation for depositing diamond films on substrates made of steel or metal hardened in situ using hard coatings of metal / metal carbide such as intermediate layers for improving adhesion between film and substrate type carbon.; The invention relates to a method of "in situ" multilayer deposition of hard coatings of W / WC / DLC (tungsten / tungsten carbide / diamond -like carbon) by PVD (Physical Vapor Deposition) method reactive sputtering assisted by magnetic field (magnetron sputtering) from a single binary tungsten white circular half (99.99%) and half carbon (99.99%). Deposition of multilayers W / WC / DLC from this unique binary black is obtained with gradual variation of the percentage of CH {4} (methane) in the Ar / CH {4} (argon / methane) mixture is introduced in the chamber where the plasma glow discharge which results in the deposition of the multilayers is generated. This method produces an improved adhesion to substrates DLC steels using films W / WC as interlayers.