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首页> 外文期刊>Solid state sciences >Enhanced multiferroic properties of tetragonally strained epitaxial BiMnO3 thin films grown on single crystal Rh substrates
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Enhanced multiferroic properties of tetragonally strained epitaxial BiMnO3 thin films grown on single crystal Rh substrates

机译:在单晶RH基板上生长的四边形紧张外延BIMNO3薄膜的增强型多体性质

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摘要

Epitaxial BiMnO3 (BMO) thin films with tetragonally strained structures were fabricated and their multiferroic properties were investigated in order to improve the leakage current characteristics of the BMO thin films and to secure the excellent multiferroic properties. The x-ray diffraction experiment confirmed that the BMO thin films grown on the Rh substrates had noticeably tetragonally strained structure compared to the BMO thin films on the Nb doped SrTiO3 substrates. As a result, the leakage current characteristics of the BMO thin films were improved, and the ferroelectric hysteresis loops were also excellent enough to be used for the nonvolatile memory devices. In addition, it was confirmed that the BMO thin films had a multiferroic property by measuring the ferromagnetic hysteresis loops of the BFM thin films, and it was confirmed that the ferromagnetic properties were improved by the tetragonal strain. Further, the band gaps of the BMO thin films were measured and it was confirmed that the band gap of the strained BFO thin film was increased.
机译:制造具有四边形应变结构的外延BimnO3(BMO)薄膜,并研究了它们的多二二核性质以改善BMO薄膜的漏电流特性并确保优异的多体性能。 X射线衍射实验证实,与Nb掺杂的SRTIO3基材上的BMO薄膜相比,在RH基质上生长的BMO薄膜具有明显的四边形紧张的结构。结果,改善了BMO薄膜的漏电流特性,并且铁电磁滞回路也足够优于用于非易失性存储器件。另外,证实BMO薄膜通过测量BFM薄膜的铁磁滞后环,并确认通过四边形菌株改善铁磁性。此外,测量了BMO薄膜的带间隙,证实应变BFO薄膜的带隙增加。

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