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Investigation of capacitance voltage characteristics of strained Si/SiGe n-channel MODFET varactor

机译:应变Si / SiGe N沟道MODFET变容级电容电压特性研究

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This work is concerned with the investigation of Capacitance-Voltage (CV) behavior of n-channel Si/SiGe MODFET varactors. This investigation provides a valuable insight into the high frequency response of the device under test and its dependence on design parameters; especially regarding the modulation layer doping concentration. The heterostructure under consideration is much more complicated than conventional MOS varactor with respect to non-uniform doping, energy band offsets and the pn-junction in series. Subsequently, CV characterization has never been applied to such MODFET varactor structure. Experimental CV measurements have shown a non-monotonic behavior with a transition point minimum and higher saturation levels on both sides, in contradiction to the conventional high frequency MOS characteristics. This behavior was confirmed qualitatively using simulations. Moreover, we explain some fundamental capacitance properties of the structure, which provide already very interesting perceptions of the MODFET varactor operation, modeling and possible applications using the obtained stimulating results. (C) 2016 Elsevier Masson SAS. All rights reserved.
机译:这项工作涉及N沟道SI / SIGE MODFET变容仪的电容电压(CV)行为的研究。本研究提供了对所测试设备的高频响应的有价值的见解及其对设计参数的依赖性;特别是关于调制层掺杂浓度。所考虑的异质结构比传统的MOS变容级相对于不均匀的掺杂,能带偏移和串联的PN结复杂得多。随后,CV表征从未应用于这种MODFET变容级结构。实验性CV测量表明,在两侧的过渡点最小和饱和水平的过渡点,与传统的高频MOS特性相矛盾。使用模拟确认此行为。此外,我们解释了结构的一些基本电容特性,它提供了使用所获得的刺激结果的MODFET变容仪操作,建模和可能应用的非常有趣的看法。 (c)2016 Elsevier Masson SAS。版权所有。

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