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首页> 外文期刊>Solar Energy Materials and Solar Cells: An International Journal Devoted to Photovoltaic, Photothermal, and Photochemical Solar Energy Conversion >Degradation and regeneration of radiation-induced defects in silicon: A study of vacancy-hydrogen interactions
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Degradation and regeneration of radiation-induced defects in silicon: A study of vacancy-hydrogen interactions

机译:硅中辐射诱导缺陷的降解和再生:空位 - 氢相互作用的研究

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Silicon lattice vacancies exist in all silicon wafers, will increase in concentration due to high temperature processing, can form recombination active defects and have been proposed as a possible candidate for LeTID. Despite this, there have been relatively few studies in the solar field dedicated to investigating vacancies, their recombination properties or their interaction with hydrogen. In this work, we use high energy electron radiation to create large numbers of vacancies in silicon and study the lifetime response to subsequent thermal processes in the presence or absence of bulk hydrogen. The radiation results in the formation of radiation-induced defects which we interpret as being related to the creation of vacancies in the silicon bulk. Modelling of injection dependent minority carrier lifetime finds that the defects formed via this radiation process have different Shockley-Read-Hall properties to LeTID and are as such, unlikely to be related. Furthermore, this defect can be removed during low temperature annealing but only if hydrogen is present in the bulk of the silicon wafers. This is in contrast to samples with no bulk hydrogen which do not recover during low temperature annealing. The study thus finds no evidence for any link between LeTID and vacancies in silicon, but it does demonstrate the ability of hydrogen to repair radiation damage.
机译:在所有硅晶片中存在硅晶格障碍,由于高温处理,浓度浓度增加,可以形成重组活性缺陷,并已提出作为LetID的可能候选者。尽管如此,在致力于调查空位,其重组性质或其与氢的相互作用的太阳能领域已经相对较少。在这项工作中,我们使用高能电子辐射在硅中产生大量空位,并研究在存在或不存在本体氢气中的随后热过程的寿命响应。辐射导致形成辐射诱导的缺陷,我们将我们解释为与硅散装空缺的创建有关的缺陷。注射依赖性少数型载体寿命的建模发现,通过该辐射过程形成的缺陷对LetId具有不同的震撼读堂厅属性,因此不太可能与之相关。此外,在低温退火期间可以除去该缺陷,但是仅在硅晶片中存在氢气中的氢气。这与具有在低温退火期间没有恢复的块状氢的样品相反。因此,该研究没有发现硅和硅之间空位之间的任何联系的证据,但它确实证明了氢气修复辐射损伤的能力。

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