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首页> 外文期刊>SID International Symposium: Digest of Technology Papers >Effect of Light Shielding Metal on the Performance of a-IGZO TFTs with a Self-Aligned Top-Gate Structure
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Effect of Light Shielding Metal on the Performance of a-IGZO TFTs with a Self-Aligned Top-Gate Structure

机译:光屏蔽金属对自对准顶栅结构的A-IGZO TFT性能的影响

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摘要

The electrical characteristics of self-aligned top-gate IGZO TFTs with a different light shielding metal (SM) layer design is investigated and compared in this paper. It is found that the TFT with floating SM has best stability regardless the SM induced barrier lower. However, SM connected to drain has a worst stability, off state current, initial threshold voltage (Vth) and serious kink-effect. Achievements can be attained by connecting SM to gate or source electrode for better input, output characteristics and stability especially to gate electrode for best gate controllability.
机译:采用不同的遮光金属(SM)层设计的自对准顶栅IGZO TFT的电特性进行了研究,并在本文中进行了比较。 发现具有浮动SM的TFT具有最佳稳定性,无论SM诱导的屏障都较低。 然而,SM连接到漏极具有最差的稳定性,关闭状态电流,初始阈值电压(Vth)和严重的扭结效果。 通过将SM连接到栅极或源电极可以实现更好的输入,输出特性和稳定性,可以实现成果,特别是用于最佳栅极可控性的栅极电极。

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