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Ultrathin Wafer Pre-Assembly and Assembly Process Technologies: A Review

机译:超薄晶圆的预组装和组装工艺技术:回顾

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摘要

Ultrathin silicon wafer technology is reviewed in terms of the semiconductor applications, critical challenges, and wafer pre-assembly and assembly process technologies and their underlying mechanisms. Mechanical backgrinding has been the standard process for wafer thinning in the semiconductor industry owing to its low cost and productivity. As the thickness requirement of wafers is reduced to below 100m, many challenges are being faced due to wafer/die bow, mechanical strength, wafer handling, total thickness variation (TTV), dicing, and packaging assembly. Various ultrathin wafer processing and assembly technologies have been developed to address these challenges. These include wafer carrier systems to handle ultrathin wafers; backgrinding subsurface damage and surface roughness reduction, and post-grinding treatment to increase wafer/die strength; improved wafer carrier flatness and backgrinding auto-TTV control to improve TTV; wafer dicing technologies to reduce die sidewall damage to increase die strength; and assembly methods for die pick-up, die transfer, die attachment, and wire bonding. Where applicable, current process issues and limitations, and future work needed are highlighted.
机译:从半导体应用,关键挑战,晶圆预组装和组装工艺技术及其潜在机理等方面对超薄硅晶圆技术进行了回顾。由于其低成本和高生产率,机械背磨已成为半导体行业中晶圆薄化的标准工艺。随着晶圆厚度要求降低到100m以下,由于晶圆/模头弯曲,机械强度,晶圆处理,总厚度变化(TTV),切割和封装组装,面临许多挑战。已经开发了各种超薄晶片处理和组装技术来应对这些挑战。这些包括处理超薄晶圆的晶圆载具系统;背面研磨表面损伤和表面粗糙度降低,以及后研磨处理以提高晶片/芯片强度;改进了晶圆载具的平整度,并通过反向研磨自动TTV控制来改善TTV;晶圆切割技术可减少芯片侧壁损坏,提高芯片强度;以及用于芯片拾取,芯片转移,芯片附接和引线键合的组装方法。在适用的情况下,突出显示当前的过程问题和局限性以及需要的未来工作。

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