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首页> 外文期刊>Crystal Research and Technology: Journal of Experimental and Industrial Crystallography >The stress birefringence images of low angle grain boundaries in 6H-SiC single crystals
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The stress birefringence images of low angle grain boundaries in 6H-SiC single crystals

机译:6H-SiC单晶中低角度晶界的应力双折射图像

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摘要

Low angle grain boundaries, also referred to as domain walls, is one of the major structural defects in c-axis physical vapor transport (PVT) grown hexagonal Silicon Carbide. To investigate the nature of the low angle boundaries, polarized optical microscope was used. The low angle boundary gives bright stress birefringence images under polarizing optical microscope. Periodic extinction of the stress birefringence images occurs when the (0001)-face SiC is rotated under polarizing optical microscope. The micro-structure of the low angle boundary is proposed. Using dislocation elastic theory, it is theoretically confirmed that the domains consist of uniform pure edge dislocations with Burgers vectors perpendicular to the dislocation arrays. The simulation results coincide with the experimental observations.
机译:低角度晶界(也称为畴壁)是c轴物理气相传输(PVT)生长的六方碳化硅的主要结构缺陷之一。为了研究低角度边界的性质,使用了偏振光学显微镜。在偏光光学显微镜下,低角度边界可提供明亮的应力双折射图像。当(0001)面SiC在偏振光学显微镜下旋转时,应力双折射图像发生周期性消光。提出了低角度边界的微观结构。使用位错弹性理论,从理论上证实该域由均匀的纯边缘位错组成,Burgers向量垂直于位错阵列。仿真结果与实验结果一致。

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