首页> 外文会议>Journal of Rare Earths vol.24 Spec. Issue March 2006 >Low-Angle Grain Boundaries in Sublimation Grown 6H-SiC Crystals
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Low-Angle Grain Boundaries in Sublimation Grown 6H-SiC Crystals

机译:升华生长的6H-SiC晶体中的低角度晶界

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High-resolution X-ray diffractometry (HRXRD) was used to assess the quality of 6H-SiC crystals grown by sublimation method. The results show the occurrence of low-angle grain boundaries (LB) is close relative to the inclination of the crystal interface. At the central faceted region with 0° inclination the crystal is of high structural perfection. However, at the region close to the facet with less than 5° inclination LB occurs slightly and at the region close to the peripheral poly-type ring with more than 5° inclination LB defect occurs heavily. The density of LB can be drastically reduced by decreasing radial temperature gradient that determines the shape of the crystal growth interface.
机译:高分辨率X射线衍射仪(HRXRD)用于评估通过升华法生长的6H-SiC晶体的质量。结果表明,低角度晶界(LB)的出现与晶体界面的倾角接近。在倾斜度为0°的中心刻面区域,晶体具有很高的结构完美度。然而,在倾斜度小于5°的小面附近的区域中出现少量,而在倾斜度大于5°的外周多型环附近的区域中严重出现缺陷。可以通过降低确定晶体生长界面形状的径向温度梯度来大幅降低LB的密度。

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