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Growth of SiC bulk crystals for application in power electronic devices - process design, 2D and 3D X-ray in situ visualization and advanced doping

机译:SiC块状晶体的生长,用于电力电子设备-工艺设计,2D和3D X射线原位可视化以及先进的掺杂

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摘要

Silicon carbide single crystals have become widely used as substrates for power electronic devices like diodes and electronic switches. Today, 4inch and 6inch wafer diameters are commercially available which are processed from vapor grown crystals. The state of the art physical vapor transport method may be called mature. Nevertheless, low defect density and uniform doping are still topics which can be further improved by current research and development of more sophisticated processes and process control. The aim of the paper is to review the physical vapor transport growth method as applied today. Special emphasis will be put on currently less advanced in situ growth monitoring tools based on 2D and 3D X-ray imaging that could be a tool for production monitoring. These techniques allow a precise determination of the crystal and source material evolution. Another topic will be the processing of highly conductive p-type 4H-SiC which is of particular interest for power electronic switches.
机译:碳化硅单晶已被广泛用作诸如二极管和电子开关之类的电力电子设备的基板。如今,有4英寸和6英寸晶圆直径可商购,它们是用气相生长晶体加工而成的。现有技术的物理蒸汽传输方法可以称为成熟的。然而,低缺陷密度和均匀掺杂仍然是主题,可以通过当前对更复杂工艺和工艺控制的研究与开发来进一步改善。本文的目的是回顾当今应用的物理蒸气传输生长方法。将特别强调基于2D和3D X射线成像的当前不太先进的原位生长监测工具,该工具可能是生产监测的工具。这些技术可以精确确定晶体和源材料的演变。另一个主题是高导电性p型4H-SiC的加工,这对于功率电子开关特别重要。

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