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Deposition of ZnO thin films by ultrasonic spray pyrolysis technique. Effect of the milling speed and time and its application in photocatalysis

机译:超声波喷雾热解技术沉积ZnO薄膜。 铣削速度和时间的影响及其在光催化中的应用

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Zinc oxide (ZnO) thin films were deposited on soda lime glass substrates by the ultrasonic spray pyrolysis technique (USP), starting from zinc acetylacetonate. A novelty process was implemented to the Zn precursor, previous to the solution preparation, namely, the Zn precursor was milled in a planetary ball milling equipment at different speed and time conditions, in order to generate new chemical species. The starting solutions were prepared by dissolving the milled precursor in a mix of methanol, acetic acid, and water. ZnO thin films were deposited at different substrate temperatures, 375, 400 and 450 degrees C and constant deposition time, 6 min. Sprayed ZnO films were characterized by X-ray diffraction, XRD, UV-Vis spectrophotometry and scanning electron microscopy, SEM. All films presented a wurtzite hexagonal phase confirmed from XRD, and corroborated by SEM analysis. Films exhibited a maximum optical transmittance oscillating between 80 and 85%. A band gap varying between 3.3 and 3.4 eV was estimated from the transmittance spectra. The photocatalytic response of ZnO thin films was tested by monitoring the bleaching of methylene blue (MB) dye at different time periods, under UV light irradiation. It was observed an increase in the degradation performance of the dye in all the films deposited from milled precursor, as compared with those deposited from unmilled precursor, since the MB degradation increased from 40 to 99% in 3 h. Novel mechanochemical process implemented to conventional chemical techniques enhanced the photocatalytic response of ZnO films.
机译:通过超声波喷雾热解技术(USP)从乙炔丙酮锌开始沉积氧化锌(ZnO)薄膜沉积在钠钙玻璃基板上。在Zn前体实施了一种新颖的方法,以前在溶液制备之前,即在不同的速度和时间条件下在行星球铣设备中研磨Zn前体,以产生新的化学物质。通过将研磨的前体溶解在甲醇,乙酸和水的混合物中来制备起始溶液。 ZnO薄膜沉积在不同的基板温度,375,400和450℃并恒定沉积时间,6分钟。通过X射线衍射,XRD,UV-Vis分光光度法和扫描电子显微镜,SEM的特征在于喷涂的ZnO膜。所有薄膜呈现出从XRD证实的紫立岩六方相,通过SEM分析证实。薄膜在80%和85%之间显示出最大光学透射率。从透射谱估计3.3和3.4eV之间的带间隙。通过在不同的时间段下监测亚甲基蓝(MB)染料,在UV光照射下测试ZnO薄膜的光催化响应。与沉积从研磨前体沉积的所有薄膜中,观察到染料的降解性能的增加,因为与未填充的前体沉积的那些,因为Mb降解从3小时增加到40%至99%。实施至常规化学技术的新型机械化学工艺增强了ZnO膜的光催化响应。

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