ELECTRODEPOSITION METHOD OF ZnO CAPABLE OF DEPOSITING UNIFORM ZnO THIN FILM WITHIN SHORT TIME COMPARED WITH EXISTING METHODS BY CONTROLLING ELECTROCHEMICAL TESTING CONDITIONS

摘要

PURPOSE: To provide a method capable of preparing ZnO that is uniform and excellent in deposition ratio within a short time by saturating oxygen in a single zinc ion solution(Zn(NO3)2 xH2O) and impressing a certain voltage to a cathode(matrix). CONSTITUTION: The electrodeposition method of ZnO comprises a step of saturating oxygen in the Zn(NO3)2 xH2O electrolyte after filling a Zn(NO3)2 xH2O electrolyte(11) with a concentration of 50 to 500 mmol into a reactor comprising cathode(1), counter electrode(2) and reference electrode(3); a step of depositing a zinc oxide(ZnO) thin film on the surface of the cathode by maintaining the electrolyte in a temperature range of 50 to 80 deg.C and impressing a reduction potential of -0.45 to -0.92 V to the electrolyte; and a step of drying the deposited zinc oxide thin film, wherein the cathode is one selected from the group consisting of ITO(indium tin oxide), SnO2 and Pt, wherein the counter electrode is one selected from the group consisting of Zn, Pt and Au, wherein the reference electrode is SCE(saturated calomel electrode), and wherein the deposition is performed for 15 to 180 minutes.