Influence of Deposition Temperature and N_2 Flow Rate on High Quality ZnO Thin Film Deposited on SiO_2/Si Substrate by Ultrasonic Spray Pyrolysis

摘要

ZnO thin films were prepared on SiO_2/Si substrate by ultrasonic spray pyrolysis (USP) method using the aqueous solution of zinc acetate dehydrate. X-ray diffraction (XRD) and atomic force microscopy (AFM) were employed to analyze the crystalline and microscopic structure of the films. The properties of ZnO films were investigated with respect to deposition temperature (T_s) and N_2 flow rate (f). The results show that ZnO thin films exhibit hexagonal wurtzite structure and the highly preferential orientation along c-axis under T_s = 320 deg C and f = 5 L/min deposition condition.