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Tailoring the interfacial microstructure and mechanical strength of SiC ceramic joints using joining temperature and interlayer thickness

机译:使用连接温度和层间厚度纵向SiC陶瓷接头的界面微观结构和机械强度

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Silicon carbide ceramic joints solid state diffusion bonded by spark plasma sintering with Ti/Ta-5W/Ti multiinterlayer in the temperature range from 1250 degrees C to 1500 degrees C were investigated in detail in terms of interfacial microstructure, elemental diffusion, phase constituents, shear strength, and fracture morphology. Layered reaction layers consisting of carbides (TiC, Ti3SiC2, (Ta,Ti,W)C), silicide ((Ta,Ti,W)(5)Si-3) and Ta-rich solid solution (Ta,Ti,W) formed at the SiC/Ti/Ta-5W interfaces. It was found that joining temperature could be decreased from 1600 degrees C to 1300 degrees C by inserting the Ti foil between SiC and Ta-5W. Nevertheless, an attempt to further decrease the joining temperature to 1250 degrees C failed even using a thin Ti foil. The initial thickness interlayer and the number of interlayer had an influence on the interfacial diffusion bonding at SiC/Ti interface. Higher joining temperature was needed to achieve a tough interface joining for a thick interlayer compared with a thin interlayer. The increase of interlayer number also required higher joining temperature. The shear strength reached 123.5 +/- 25.3 MPa for the joint diffusion bonded at 1300 degrees C.
机译:通过在界面微观结构,元素扩散,相成分,剪切方面,在1250℃至1500℃的温度范围内通过火花等离子体烧结粘合的碳化硅陶瓷接头通过火花等离子体烧结粘合的固态扩散在1250℃至1500摄氏度的范围内。力量和骨折形态。由碳化物(TiC,Ti3 SiC 2,(Ta,Ti,W)C),硅化物((Ta,Ti,W)(5)Si-3)和Ta,Ta,Ti,W)组成的分层反应层。(Ta,Ti,W)形成在SiC / TI / TA-5W接口。发现接合温度可以通过在SiC和Ta-5w之间插入Ti箔而从1600℃到1300℃下降。然而,即使使用薄的Ti箔,也会尝试进一步将连接温度降低到1250摄氏度。初始厚度中间层和中间层的数量对SiC / Ti界面处的界面扩散键合产生影响。需要更高的接合温度以实现与薄的中间层相比厚层间的坚韧接口接合。中间值数的增加也需要更高的接合温度。用于在1300℃的关节扩散达到123.5 +/- 25.3MPa的剪切强度。

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