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首页> 外文期刊>ACS nano >In Situ Tuning of Magnetization and Magnetoresistance in Fe3O4 Thin Film Achieved with All-Solid-State Redox Device
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In Situ Tuning of Magnetization and Magnetoresistance in Fe3O4 Thin Film Achieved with All-Solid-State Redox Device

机译:全固态氧化还原器件实现Fe3O4薄膜的磁化和磁阻原位调节

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摘要

An all-solid-state redox device composed of Fe3O4 thin film and Li+ ion conducting solid electrolyte was fabricated for use in tuning magnetization and magneto resistance (MR), which are key factors in the creation of high-density magnetic storage devices. Electrical conductivity, magnetization, and MR were reversibly tuned by Li+ insertion and removal. Tuning of the various Fe3O4 thin film properties was achieved by donation of an electron to the Fe3+ ions. This technique should lead to the development of spintronics devices based on the reversible switching of magnetization and spin polarization (P). It should also improve the performance of conventional magnetic random access memory (MRAM) devices in which ON/OFF ratio has been limited to a small value due to a decrease in P near the tunnel barrier.
机译:制造了由Fe3O4薄膜和Li +离子导电固体电解质组成的全固态氧化还原器件,用于调节磁化强度和磁阻(MR),这是创建高密度磁存储器件的关键因素。通过插入和移除Li +可逆地调节电导率,磁化强度和MR。通过向Fe3 +离子提供电子,可以调节各种Fe3O4薄膜的性能。该技术应导致基于磁化和自旋极化(P)的可逆切换的自旋电子器件的开发。它还应该改善常规磁性随机存取存储器(MRAM)器件的性能,在该器件中,由于隧道势垒附近的P减小,开/关比被限制在较小的值。

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