Non-specialty gases increase role in leading-edge semiconductor processing

摘要

The use of carbon dioxide and hydrogen is increasing in state-of-the-art semiconductor manufacturing. Previously hydrogen was used in semiconductor manufacturing as a carrier gas and for other minor applications, and carbon dioxide was studied as a high-purity gas material for CVD. Now, these gases have found far more important applications. Those applications are in the leading-edge 3D-NAND flash memory device and FinFET DRAM processing.