DISPOSAL OF WASTE FLUORIDE AND CHLORIDE GASES IN THE MANUFACTURING PROCESS OF SEMICONDUCTORS

摘要

The chemical reactions of fluoride and chloride gases with metal chloride or metal oxide are utilized as an effective treatment for harmless disposal. These chemical reactions can be adopted in the temperature range of 80 deg C approx 400 deg C, which is lower than that in the combustion treatment (800 deg C). Reaction products are metal fluoride or metal chloride which are a harmless and a valuable chemical material as one of new resources. This paper concerns with a new harmless disposal treatment of toxic global warming gases.