METHODS AND APPARATUS FOR INCREASING THE UTILIZATION EFFICIENCY OF GASES DURING SEMICONDUCTOR PROCESSING

摘要

The present invention provides a processing system including a processing chamber and a gas source coupled to the processing chamber for supplying gas to the processing chamber. A pump is located adjacent to the processing chamber and coupled with the processing chamber to pump gas from the processing chamber. The processing system further includes a regeneration line coupled with the pump and used to circulate at least one or more portions of the gas pumped from the processing chamber back into the processing chamber. The invention also provides methods for cleaning deposition chambers and etching semiconductor substrates.