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METHODS AND APPARATUS FOR INCREASING THE UTILIZATION EFFICIENCY OF GASES DURING SEMICONDUCTOR PROCESSING
METHODS AND APPARATUS FOR INCREASING THE UTILIZATION EFFICIENCY OF GASES DURING SEMICONDUCTOR PROCESSING
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机译:在半导体加工过程中提高气体利用效率的方法和装置
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摘要
A processing system is provided that includes a processing chamber, and a source of gas coupled to the processing chamber for supplying a gas thereto. A pump is located adjacent the processing chamber, and is coupled to the processing chamber for pumping the gas from the processing chamber. The processing system further includes a recycling line, coupled to the pump and adapted to cycle at least a portion of the gas pumped from the processing chamber back into the processing chamber. Methods for cleaning deposition chambers and for etching semiconductor substrates are also provided. IMAGE
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