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首页> 外文期刊>ECS Journal of Solid State Science and Technology >Anodic Synthesis of beta-Ni(OH)(2) Thin Films on Si(100)
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Anodic Synthesis of beta-Ni(OH)(2) Thin Films on Si(100)

机译:β-镍(OH)(2)薄膜在Si(100)上的阳极合成

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In this work is described the synthesis of Ni(OH)(2) thin films on top of monocrystalline n-type silicon (100) via anodic electrodeposition assisted by light. As electrolyte was employed an aqueous solution of NiSO(4 center dot)6H(2)O. The Ni(OH)(2) electrodeposition was carried out at two NiSO(4 center dot)6H(2)O concentrations, 0.50 and 0.75 M, and at constant electrolyte temperatures ranging from 10 to 25 degrees C. Potentiostatic current density transients, obtained during Ni(OH)(2) deposition, pointed out that the Ni(OH)(2) nucleation dynamics depend on the tested electrolyte conditions. The Ni(OH)(2) films were investigated by contact profilometry, field emission scanning electron microscopy, Raman spectroscopy, X-ray diffraction and X-ray photoelectron spectroscopy. The results showed that the as-deposited films correspond to beta-Ni(OH)(2) unstable phase, which is progressively converted, by environment aging in air atmosphere, to alpha-Ni(OH)(2) after similar to 10 days. The beta-Ni(OH)(2) film is stable and its surface presents a uniform and shiny coloring in the entire film. Its surface has a uniform porous nanostructure, which characteristics depends on the synthesis parameters, salt concentration and electrolyte temperature. (C) 2017 The Electrochemical Society. All rights reserved.
机译:在该作品中,通过光的阳极电沉积在单晶N型硅(100)顶部的Ni(OH)(2)薄膜的合成。作为电解质使用NISO(4中心点)6H(2)O的水溶液。 Ni(OH)(2)电沉积在两个NISO(4中心点)6H(2)o浓度,0.50和0.75μm,恒定电解质温度范围为10至25摄氏度。电位电流密度瞬变,在Ni(OH)(2)沉积期间获得,指出Ni(OH)(2)核动力学取决于测试的电解质条件。通过接触轮廓测定,场发射扫描电子显微镜,拉曼光谱,X射线衍射和X射线光电子能谱来研究Ni(OH)(2)膜。结果表明,沉积的薄膜对应于β-Ni(OH)(2)不稳定的相位,其通过空气气氛中的环境老化逐渐转化为α-Ni(OH)(2)之后。 β-Ni(OH)(2)薄膜是稳定的,其表面在整膜中呈均匀和闪亮着色。其表面具有均匀的多孔纳米结构,该特性取决于合成参数,盐浓度和电解质温度。 (c)2017年电化学协会。版权所有。

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    Univ Fed Santa Catarina Dept Fis Lab Filmes Finos &

    Superficies BR-88040900 Florianopolis SC Brazil;

    Univ Fed Santa Catarina Dept Fis Lab Filmes Finos &

    Superficies BR-88040900 Florianopolis SC Brazil;

    Ctr Brasileiro Pesquisas Fis BR-22290180 Rio De Janeiro Brazil;

    Univ Fed Santa Catarina Dept Fis Lab Filmes Finos &

    Superficies BR-88040900 Florianopolis SC Brazil;

    Univ Fed Santa Catarina Dept Fis Lab Filmes Finos &

    Superficies BR-88040900 Florianopolis SC Brazil;

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  • 正文语种 eng
  • 中图分类 电化学工业 ;
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