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Growth behavior and dielectric properties of K/Mg alternately doped BST films

机译:K / Mg的生长行为和介电性能交替掺杂BST薄膜

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There has been no report on the influence of film growth behavior on the dielectric properties of BST films alternately doped with K and Mg up to now, thereby 1%K and 1%Mg alternately doped Ba0.6Sr0.4TiO3 (K/Mg-BST) films with various thicknesses were prepared by an improved sol-gel method, and their growth behaviors and dielectric properties were studied in this paper. The K/Mg-BST films were designed as KBST/MgBST/...multilayer films composed of 1 approximate to 8 layers with the first K doped BST layer (about 120nm/layer). 1, 3, 5 and 7-layer films were not annealed, while 2, 4, 6 and 8-layer films were annealed. 7 or 8-layer pure BST, Mg-BST, K-BST and Mg/K-BST (with the first Mg doped BST layer) films were compared. All films show ABO(3) cubic perovskite polycrystalline structures and grow mainly along (110) orientation. The K/Mg-BST films show enhancing crystallizations but fluctuant lattice constants with increasing film thickness. However, the not annealed films show larger lattice constants than the annealed films, and Mg2+ ions tend to replace Ti4+ ions and show acceptor doping mechanism. K+ ions in the not annealed films have a tendency to substitute for Sr2+ ions, and in the annealed films tend to replace Ba2+ ions. Increasing film thickness promotes K+ ions replacing Sr2+ ions and Ba2+ ions, and causes acceptor doping mechanism. The Mg/K-BST films show island growth with the fastest speed, while the other films show layer growth. The K/Mg-BST films reveal the slowest growing speed, and increasing film thicknesses gradually improve surface morphologies, thus show better comprehensive dielectric properties than K or Mg-BST films. 7-layer and 8-layer K/Mg-BST films display excellent comprehensive dielectric properties, but 7-layer film is more suitable for tunable microwave applications owing to smaller capacitance.
机译:没有关于薄膜生长行为对现在掺杂的BST薄膜的介电性能的影响报告,从而掺杂K和MG,从而1%K和1%Mg交替掺杂Ba0.6SR0.4TiO3(K / MG-BST )通过改进的溶胶 - 凝胶法制备具有各种厚度的薄膜,并在本文中研究了它们的生长行为和介电性能。 K / Mg-BST膜设计为KBST / MGBST / ...多层膜,其由1个近似为8层与第一K掺杂BST层(约120nm /层)组成。 1,3,5和7层膜未退火,而2,4,6和8层膜退火。比较了7或8层纯BST,Mg-BST,K-BST和Mg / K-BST(用第一个Mg掺杂BST层)薄膜。所有胶片显示ABO(3)立方钙钛矿多晶结构,主要沿(110)取向生长。 K / MG-BST膜显示出增强结晶,而是具有增加的薄膜厚度的晶格常数波动。然而,NOT退火的薄膜显示出比退火薄膜更大的晶格常数,Mg2 +离子倾向于代替Ti4 +离子并显示受体掺杂机制。 K +离子在不退火的薄膜中具有替代SR2 +离子的趋势,并且在退火的薄膜中倾向于取代Ba2 +离子。增加薄膜厚度促进蛋白质替代SR2 +离子和Ba2 +离子的K +离子,并导致受体掺杂机制。 Mg / K-BST薄膜显示出速度最快的岛生长,而其他薄膜显示出层生长。 K / MG-BST膜揭示了增长速度最慢,并且增加膜厚度逐渐改善表面形态,从而显示出比k或Mg-BST薄膜更好的综合介电性能。 7层和8层K / MG-BST薄膜显示出优异的综合介电性能,但由于较小的电容,7层膜更适合于可调谐微波应用。

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