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Electrical Transport Anisotropy Controlled by Oxygen Vacancy Concentration in (111) LaAlO_3/SrTiO_3 Interface Structures

机译:通过(111)LAALO_3 / SRTIO_3接口结构的氧空位浓度控制的电气传输各向异性

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摘要

The 2D conducting gas that forms at the interface between the two insulators LaAlO_3 (LAO) and SrTiO_3 (STO) has garnered a lot of attention due to wide variety of physical phenomena that it exhibits, including strong spin–orbit coupling, superconductivity, magnetism, and localization effects,[13] among others. From the earliest studies, it has been well established that the conditions during film growth or the post-growth treatment of samples can have a substantial effect on the properties of the interface. In particular, the amount of oxygen vacancies introduced during growth or through post-growth treatment can change the conductance of the LAO/STO interface by orders of magnitude.
机译:在两个绝缘体Laalo_3(Lao)和SRTio_3(STO)之间的界面形成的2D导电气由于它展示的各种物理现象,包括强大的旋转轨道耦合,超导,磁性, 和本地化效应,[13]等。 从最早的研究来看,已经很好地确定了薄膜生长期间的条件或样品后生长治疗可以对界面的性能产生显着影响。 特别地,在生长期间或通过后生长后处理期间引入的氧空位量可以通过数量级来改变老挝/ STO界面的电导。

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